Methoxy propanol and ethylene glycol ether belong to binary alcohol ether solvents, which are colorless and transparent liquids. The toxicity of propylene glycol ether to human body is lower than that of ethylene glycol ether products, and it belongs to low toxic ethers. Propylene glycol methyl ether has a faint ether smell, but no strong pungent smell, making it more widely used and safe. Because its molecular structure contains both ether group and hydroxyl group, it has excellent solubility, suitable volatilization rate and reaction activity, and has been widely used. It is mainly used as an excellent solvent for nitrocellulose, alkyd resin and maleic anhydride modified phenolic resin, as an antifreeze for jet fuel and an additive for brake fluid; It is mainly used as solvent, dispersant and diluent, and also as fuel antifreeze and extractant.
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Chemical Formula |
C4H10O2 |
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Exact Mass |
90 |
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Molecular Weight |
90 |
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m/z |
90 (100.0%), 91 (4.3%) |
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Elemental Analysis |
C, 53.31; H, 11.18; O, 35.51 |
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The preparation method of Methoxy Propanol (usually more accurately referred to as propylene glycol monomethyl ether) is described as follows:
(1) Raw material preparation:
Obtain epichlorohydrin and methanol as reactants.
Prepare a catalyst, which is diatomaceous earth embedded with ferric chloride. Among them, the weight of ferric chloride is 2% of the weight of epichlorohydrin.
(2) Device settings:
Choose a container suitable for high-pressure and high-temperature reactions, such as a high-pressure reactor.
Set up a temperature and pressure control system for the reaction vessel to ensure precise control of the reaction temperature and pressure.
(1) Mixing raw materials:
Mix epoxy propane and methanol evenly in a molar ratio of 1:3.
(2) Add catalyst:
Add the prepared diatomaceous earth catalyst embedded with ferric chloride to the reaction mixture.
(3) Heating reaction:
Heat the reaction mixture to 190 ℃.
Maintain the reaction pressure at 1.5 MPa (or 1500 kPa).
The reaction time is 50 minutes.
Vacuum distillation: After the reaction is complete, the reaction mixture is subjected to vacuum distillation to separate propylene glycol monomethyl ether.
Reduced pressure distillation helps to lower the distillation temperature, thereby reducing the decomposition of thermosensitive products.
(1) Yield determination: The yield of propylene glycol monomethyl ether was determined by weighing or other appropriate methods, and the yield was 98.2%.
(2) Purity testing: Use chromatography or other analytical techniques to test the purity of the product, and obtain a purity of 99.1%.
The application of Methoxy Propanol (also known as 1-methoxy-2-propanol, abbreviated as PGME) in semiconductor photoresist is an important and specialized field among its many uses. Photoresist is an indispensable material in the semiconductor manufacturing process, mainly used for microfabrication of integrated circuits and semiconductor discrete devices. It also has a wide range of applications in the production processes of flat panel displays, LEDs, flip flops, magnetic heads, and precision sensors. Propylene glycol methyl ether, as an important solvent component of photoresist, plays a crucial role in the performance and manufacturing process of photoresist.
Photoresist, also known as photoresist, is composed of main components and solvents. The main solvent currently used for photoresist is propylene glycol methyl ether acetate (PMA), but propylene glycol methyl ether (PGME) is also used as a solvent or auxiliary solvent in some photoresist formulations. The main components of photoresist include resin, monomers, photoinitiators, and additives. Among them, the resin content accounts for about 50% to 60% of the main components, and the monomer content accounts for about 35% to 45%. The principle of photoresist is to use light sources such as ultraviolet light, excimer laser, electron beam, ion beam, X-ray, etc. to irradiate or radiate, causing a change in its solubility, thereby forming the desired pattern on the silicon wafer.
2. The Role Of Propylene Glycol Methyl Ether In Photoresist
(1) Solvent action:
Propylene glycol methyl ether is mainly used as a solvent in photoresist. It can dissolve solid photosensitizers and additives to form a liquid mixture, ensuring good flowability of photoresist. This fluidity is crucial for the uniform coating of photoresist on the wafer surface through spin coating technology.
(2) Adjusting viscosity:
The addition of propylene glycol methyl ether can adjust the viscosity of photoresist, making it more suitable for specific coating processes. Proper adjustment of viscosity helps ensure uniform distribution of photoresist during the coating process, avoiding the generation of bubbles and defects.
(3) Improving coating performance:
Propylene glycol methyl ether has moderate volatility and can quickly evaporate during the coating process, leaving a uniform and dense photoresist film. This helps to improve the adhesion and corrosion resistance of photoresist.
(4) Influence on lithography effect:
Some physical and chemical properties of propylene glycol methyl ether, such as boiling point, solubility, and surface tension, can have a certain impact on the lithography effect of photoresist. For example, an appropriate boiling point can ensure that the photoresist does not deform the pattern during exposure due to rapid solvent evaporation.
3. Specific Application Of Propylene Glycol Methyl Ether In Semiconductor Photoresist
(1) High end photoresist:
In high-end photoresist, propylene glycol methyl ether may be used as an auxiliary solvent or additive. These photoresists are typically used to manufacture semiconductor devices with higher integration and more complex structures. The addition of propylene glycol methyl ether can improve the coating performance and lithography effect of photoresist, thereby increasing the yield and performance of devices.
(2) ArF photoresist:
ArF photoresist is one of the key materials used for manufacturing semiconductor devices with process nodes of 7nm and below.
Propylene glycol methyl ether may be used as a solvent or additive in ArF photoresist to improve its coating performance and lithography effect. ArF photoresist has extremely high solvent requirements, and certain properties of propylene glycol methyl ether make it a suitable choice.
(3) Other types of photoresist:
In addition to ArF photoresist, propylene glycol methyl ether may also be used in other types of photoresist, such as KrF photoresist, i-line photoresist, etc. These photoresists have different application ranges and process requirements in the semiconductor manufacturing process. The addition of propylene glycol methyl ether can adjust the performance and coating effect of photoresist according to specific needs.
4. The Influence Of Propylene Glycol Methyl Ether On Semiconductor Manufacturing Process
(1) Improving production efficiency:
The addition of propylene glycol methyl ether can improve the coating performance and lithography effect of photoresist, thereby enhancing the production efficiency of semiconductor devices. Uniform coating and clear lithography patterns help reduce defects and rework rates, shortening production cycles.
(2) Reduce production costs:
By optimizing the formulation and coating process of photoresist, the production cost of semiconductor devices can be reduced. As one of the important components of photoresist, the rational use of propylene glycol methyl ether can reduce unnecessary waste and losses, thereby lowering production costs.
(3) Improving device performance:
The improvement of photoresist performance by propylene glycol methyl ether helps to enhance the performance of semiconductor devices. For example, more uniform coating and clearer lithography patterns can reduce parasitic parameters such as resistance and capacitance of the device, and improve performance such as speed and power consumption.
(4) Promoting technological upgrading:
With the continuous development of semiconductor technology, the requirements for photoresist are also increasing. The introduction of new solvents and additives such as propylene glycol methyl ether can promote the upgrading and progress of photoresist technology, bringing more innovation and development opportunities to the semiconductor manufacturing field.
Methoxy Propanol, as one of the important components of semiconductor photoresist, has broad application prospects and advantages in the semiconductor manufacturing process. By optimizing the formulation and coating process of photoresist, the production efficiency and performance of semiconductor devices can be improved, and production costs can be reduced. However, its environmental and safety issues also need to be given sufficient attention. In the future, with the continuous development of semiconductor technology and the increasing awareness of environmental protection, the introduction of new solvents and additives such as propylene glycol methyl ether will promote the upgrading and progress of photoresist technology, bringing more innovation and development opportunities to the semiconductor manufacturing field. At the same time, it is also necessary to strengthen research and supervision on its environmental protection and safety, to ensure the sustainable development of the semiconductor manufacturing process and the safety of personnel and the environment.
Frequently Asked Questions
What is methoxy propanol used for?
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Methoxy propanol is predominately used in the manufacture of propylene glycol methyl ether acetate (otherwise known as PMA) and is also used in industrial and commercial products including paints, varnishes, inks, synthetic resin and rubber adhesives, and automotive and oven cleaners.
Is methoxy propanol toxic?
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1-Methoxy-2-propanol is a mild toxicant. The toxicity is lower than that of the methyl, ethyl, and butyl ethers of ethylene glycol. The toxic symptoms from inhaling high concentrations are nausea, vomiting, and general anesthetic effects. In humans, toxic effects may be felt at exposure to a level of 3000–4000 ppm.
What is Methoxyisopropanol used for?
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The primary use of Methoxyisopropanol is in paints. Other names for Methoxyisopropanol include 1-methoxy-2-hydroxypropane, 1-methoxy-2-propanol and Propylene Glycol Monomethyl Ether (PGME).
What is methoxypropane used for?
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Marketed under the trade names Metopryl and Neothyl, methoxypropane was used as an alternative to diethyl ether because of its greater potency. Its use as an anaesthetic has since been supplanted by modern halogenated ethers which are much less flammable.
What is methoxyphenol used for?
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Methoxyphenols are used in the manufacture of antioxidants, and pharmaceuticals. 2- Methoxyphenol is used as an expectorant, and in synthetic flavors.
Is propanol harmful to humans?
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However, only one case of lethal poisoning by 1-propanol has been reported. The most likely acute effects of 1-propanol in man are alcoholic intoxication and narcosis. The results of animal studies indicate that 1-propanol is 2 - 4 times as intoxicating as ethanol. 1-Propanol may be irritating to hydrated skin.
What are the side effects of Methoxyisopropanol?
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May cause drowsiness or dizziness. H226 Flammable liquid and vapour. H336 May cause drowsiness or dizziness. P210 Keep away from heat, hot surfaces, sparks, open flames and other ignition sources.
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